UHV systems for X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA). Sensitive to 0.1 atomic%, standard analysis includes quantitative elemental analysis as well as chemical bonding information and is possible on a variety of samples (films, polymers, ceramics, powders, etc.). Other related techniques are:

• Ion sputtering for depth profiling or contaminant removal;
• He ultraviolet source for UPS analysis (valence band information and work functions possible);
• In situ sample tilting for near-surface depth analysis;
• In situ sample heating to 800ºC;
• Air-free sample transfer pucks for loading directly from glove box;
• Elemental or chemical imaging;
• Cluster ion source.