HomeFacilitiesInstrumentsUser InstrumentsSurface Analysis and CharacterizationX-ray photoelectron spectroscopy XPS

X-ray photoelectron spectroscopy XPS

Clark D10

UHV systems for X-ray photoelectron spectroscopy (XPS), also known as electron spectroscopy for chemical analysis (ESCA). Sensitive to 0.1 atomic%, standard analysis includes quantitative elemental analysis as well as chemical bonding information and is possible on a variety of samples (films, polymers, ceramics, powders, etc.). Other related techniques are:

  • Ion sputtering for depth profiling or contaminant removal;
  • He ultraviolet source for UPS analysis (valence band information and work functions possible);
  • In situ sample tilting for near-surface depth analysis;
  • In situ sample heating to 800ºC;
  • Air-free sample transfer pucks for loading directly from glove box;
  • Elemental or chemical imaging;
  • Cluster ion source.

For rates information, please see the rates page.
Primary Contact

John Wright
Clark Hall, Room D-21
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