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Sputtering Deposition System
Clark D21
Three 2″ sources for magnetron argon sputtering of metals, ceramics, and reactively sputtered materials (using oxygen or nitrogen) via DC or RF power. Cryo-pumped system for ~10-6 Torr base pressures. Stages available for substrate rotation or substrate heating to ~500° C.
For rates information, please see the rates page.
Primary Contact
Steve Kriske
607/255-2367
sjk27@cornell.edu
Clark Hall, Room D-21
Steve Kriske
607/255-2367
sjk27@cornell.edu
Clark Hall, Room D-21
Secondary Contact
Jonathan Shu
607/255-9833
jbs24@cornell.edu
Clark Hall, Room 633