Room 150 Duffield Hall
The Helios G4 UX Focused Ion Beam (FIB) incorporates the latest electron and ion column technologies to create a very versatile and capable FIB. The Elstar electron column with the next-generation UC+ technology enables high resolution secondary and backscattered imaging even at low voltages. The Phoenix Ion Column with Fast Beam Blanker is Thermo-Fisher’s most advanced ion column. It enables high resolution imaging at milling at high voltages, but, even more importantly, continues to perform exceptionally well down to low voltages. Such low voltages are critical for the production of high-quality lamella with minimal damage layers for transmission electron microscopy (TEM). Additionally, the beam currents now extend three times higher than previously available, enabling milling of samples not previously possible due to realistic time constraints.
The sample stage is a 150 x 150 mm eucentric piezo stage with an in-chamber Nav-Cam for accurate positioning of samples. The EasyLift EX NanoManipulator, in combination with the AutoTEM4 automated software, enables automated sample production of TEM lamella, significantly reducing the time required to produce specimens.
Training is provided, and the FIB is available to novice users under the guidance of the facility manager, and to trained users 24/7. For questions please contact Mick Thomas (email@example.com).
This work made use of a Helios FIB supported by NSF (DMR-1539918) and the Cornell Center for Materials Research Shared Facilities which are supported through the NSF MRSEC program (DMR-1719875).
The lamella shown above was thinned with the Helios. Final thinning at low voltage reduces surface damage. Note that there is a gradient to the thin film from too thin (left hand side) to too thick (right hand side). Somewhere in the middle is an area of optimal thickness for high resolution imaging and EELS analysis.